Quantum interferometric optical lithography: towards arbitrary two-dimensional patterns

Pieter Kok, Agedi N. Boto, Daniel S. Abrams, Colin P. Williams, Samuel L. Braunstein, and Jonathan P. Dowling

Physical Review A 63, 063407 (2001)

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As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum lithography offers an increase in resolution below the diffraction limit. Here, we generalize this procedure in order to create patterns in one and two dimensions. This renders quantum lithography a potentially useful tool in nano-technology.

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