Quantum interferometric optical lithography: towards arbitrary two-dimensional patterns
Physical Review A 63, 063407 (2001)
As demonstrated by Boto et al. [Phys. Rev. Lett. 85, 2733 (2000)], quantum lithography offers an increase in resolution below the diffraction limit. Here, we generalize this procedure in order to create patterns in one and two dimensions. This renders quantum lithography a potentially useful tool in nano-technology.